No. |
Part Name |
Description |
Manufacturer |
181 |
SSW4N60BTM |
600V N-Channel B-FET / Substitute of SSW4N60A |
Fairchild Semiconductor |
182 |
SSW7N60BTM |
600V N-Channel B-FET / Substitute of SSW7N60A |
Fairchild Semiconductor |
183 |
TA205XXX |
TA Series / Power Chip Resisters / Thick Film on Alumina Substrate |
Ohmite |
184 |
TBA331 |
5 silicon NPN transistors on a common monolithic substrate |
SGS-ATES |
185 |
TFPT |
Linear PTC Surface Mount Chip Thermistors, Nickel barrier with tin/lead wraparound terminations, Alumina substrate base with PTC thin film element, 0603, 0805, and 1206 sizes available |
Vishay |
186 |
TR, TD |
High Voltage Resistors and Dividers, Outstanding Stability under Adverse Conditions, Stable Cermet Resistive Element Bonded to a High-Purity Alumina Substrate, Tough Epoxy-based Coating and High Voltage Stability |
Vishay |
187 |
VSP1900 |
CCD Vertical Clock Driver with Electric-Shutter and CCD Substrate Bias Control |
Texas Instruments |
188 |
VSP1900DBT |
CCD Vertical Clock Driver with Electric-Shutter and CCD Substrate Bias Control |
Texas Instruments |
189 |
VSP1900DBTR |
CCD Vertical Clock Driver with Electric-Shutter and CCD Substrate Bias Control |
Texas Instruments |
190 |
W4NRD0X-0000 |
Diameter: 50.8mm; LCW substrates; silicon carbide substrates. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition |
CREE POWER |
191 |
W4NRD0X-0000 |
Diameter: 50.8mm; LCW substrates; silicon carbide substrates. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition |
CREE POWER |
192 |
W4NRD8C-U000 |
Diameter: 50.8mm; ultra-low mircopipe density; silicon carbide substrates. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition |
CREE POWER |
193 |
W4NXD8C-0000 |
Diameter: 50.8mm; standatd mircopipe density; silicon carbide substrates. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition |
CREE POWER |
194 |
W4NXD8C-L000 |
Diameter: 50.8mm; low mircopipe density; silicon carbide substrates. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition |
CREE POWER |
195 |
W4NXD8C-S000 |
Diameter: 50.8mm; select mircopipe density; silicon carbide substrates. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition |
CREE POWER |
196 |
W4NXD8D-0000 |
Diameter: 50.8mm; standatd mircopipe density; silicon carbide substrates. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition |
CREE POWER |
197 |
W4NXD8D-S000 |
Diameter: 50.8mm; select mircopipe density; silicon carbide substrates. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition |
CREE POWER |
198 |
W4NXD8G-0000 |
Diameter: 50.8mm; standatd mircopipe density; silicon carbide substrates. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition |
CREE POWER |
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