No. |
Part Name |
Description |
Manufacturer |
9631 |
VT1697SBFQR-008 |
Smart Slave IC with Integrated Current and Temperature Sensors |
MAXIM - Dallas Semiconductor |
9632 |
VT1697SBFQX |
Smart Slave IC with Integrated Current and Temperature Sensors |
MAXIM - Dallas Semiconductor |
9633 |
VT1697SBFQX+CN9 |
Smart Slave IC with Integrated Current and Temperature Sensors |
MAXIM - Dallas Semiconductor |
9634 |
VT1697SBFQX+CNR |
Smart Slave IC with Integrated Current and Temperature Sensors |
MAXIM - Dallas Semiconductor |
9635 |
VT1697SBFQX-008 |
Smart Slave IC with Integrated Current and Temperature Sensors |
MAXIM - Dallas Semiconductor |
9636 |
VTA1 |
Temperature Controlled Crystal Oscillators |
Vectron |
9637 |
VTA2 |
Temperature Controlled Crystal Oscillators |
Vectron |
9638 |
VTA7 |
Temperature Controlled Crystal Oscillators |
Vectron |
9639 |
VTB1 |
Temperature Controlled Crystal Oscillators |
Vectron |
9640 |
VTB2 |
Temperature Controlled Crystal Oscillators |
Vectron |
9641 |
VTB4 |
Temperature Compensated Crystal Oscillators |
Vectron |
9642 |
VTC1 |
Temperature Compensated Crystal Oscillators |
Vectron |
9643 |
VTC4 |
Temperature Compensated Crystal Oscillators |
Vectron |
9644 |
VTD3 |
Temperature Compensated Crystal Oscillators |
Vectron |
9645 |
W4NRD0X-0000 |
Diameter: 50.8mm; LCW substrates; silicon carbide substrates. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition |
CREE POWER |
9646 |
W4NRD8C-U000 |
Diameter: 50.8mm; ultra-low mircopipe density; silicon carbide substrates. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition |
CREE POWER |
9647 |
W4NXD8C-0000 |
Diameter: 50.8mm; standatd mircopipe density; silicon carbide substrates. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition |
CREE POWER |
9648 |
W4NXD8C-L000 |
Diameter: 50.8mm; low mircopipe density; silicon carbide substrates. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition |
CREE POWER |
9649 |
W4NXD8C-S000 |
Diameter: 50.8mm; select mircopipe density; silicon carbide substrates. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition |
CREE POWER |
9650 |
W4NXD8D-0000 |
Diameter: 50.8mm; standatd mircopipe density; silicon carbide substrates. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition |
CREE POWER |
9651 |
W4NXD8D-S000 |
Diameter: 50.8mm; select mircopipe density; silicon carbide substrates. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition |
CREE POWER |
9652 |
W4NXD8G-0000 |
Diameter: 50.8mm; standatd mircopipe density; silicon carbide substrates. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition |
CREE POWER |
9653 |
W6NRD0X-0000 |
Diameter: 50.8mm; LCW type; 6H-silicon carbide. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition |
CREE POWER |
9654 |
W6NRE0X-0000 |
Diameter: 76.2mm; LCW type; 6H-silicon carbide. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition |
CREE POWER |
9655 |
W6NXD0K-0000 |
Diameter: 50.8mm; lsemi-insulating (prototype); 6H-silicon carbide. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition |
CREE POWER |
9656 |
W6NXD0KLSR-0000 |
Diameter: 50.8mm; lsemi-insulating (prototype); 6H-silicon carbide. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition |
CREE POWER |
9657 |
W6NXD3J-0000 |
Diameter: 50.8mm; lsemi-insulating (prototype); 6H-silicon carbide. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition |
CREE POWER |
9658 |
W6NXD3K-0000 |
Diameter: 50.8mm; lsemi-insulating (prototype); 6H-silicon carbide. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition |
CREE POWER |
9659 |
W6NXD3L-0000 |
Diameter: 50.8mm; lsemi-insulating (prototype); 6H-silicon carbide. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition |
CREE POWER |
9660 |
W6PXD3O-0000 |
Diameter: 50.8mm; lsemi-insulating (prototype); 6H-silicon carbide. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition |
CREE POWER |
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